A Morphological Study of Silicon Carbide Prepared by Chemical Vapor Deposition
- 1 January 1984
- book chapter
- Published by Springer Nature
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- The structure of chemical vapor deposited silicon carbideThin Solid Films, 1977
- Epitaxial deposition of silicon carbide from silicon tetrachloride and hexaneThin Solid Films, 1976
- Thermodynamic Studies of High Temperature Equilibria. III. SOLGAS, a Computer Program for Calculating the Composition and Heat Condition of an Equilibrium Mixture.Acta Chemica Scandinavica, 1971
- The Epitaxial Growth of Silicon CarbideJournal of the Electrochemical Society, 1966