Distributed axis electron-beam system for lithography and inspection—preliminary experimental results
- 1 November 2002
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 20 (6) , 2662-2665
- https://doi.org/10.1116/1.1520566
Abstract
A distributed-axis system can be used to avoid the space-charge limits of conventional electron-beam lithography systems. Our approach is to use a uniform magnetic field to simultaneously focus an array of beams. We have built a test bed and report the first experimental results. Sub-100 nm resolution has been obtained and is presently limited by aperture size and interference. Sub-10 nm resolution should be possible given a suitably small source.Keywords
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