Distributed, multiple variable shaped electron beam column for high throughput maskless lithography
- 1 November 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (6) , 3168-3173
- https://doi.org/10.1116/1.590458
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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