Crystal growth of ITO films prepared by DC magnetron sputtering on C film
- 1 August 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 281-282, 202-205
- https://doi.org/10.1016/0040-6090(96)08613-0
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Crystallization of Amorphous In2O3 Films during Film GrowthJapanese Journal of Applied Physics, 1991
- Microstructure and etching properties of sputtered indium—tin oxide (ITO)Physica Status Solidi (a), 1991
- Influence of substrate temperature and film thickness on the structure of reactively evaporated In2O3 filmsThin Solid Films, 1987