Thickness profiles of thin films caused by secondary reactions in flow-type atomic layer deposition reactors
- 21 June 1997
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 30 (12) , 1725-1728
- https://doi.org/10.1088/0022-3727/30/12/006
Abstract
No abstract availableKeywords
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