Hot Electrons in Amorphous Silicon

Abstract
At extremely high electric fields (F0.55MV/cm) and high temperatures (300<T<450K), full deactivation of the electron drift mobility in amorphous hydrogenated silicon (aSi:H) is obtained and therefore the shallow trapping is substantially reduced. New data clearly demonstrate that the free electron (band) mobility in aSi:H decreases when the electric field increases, contrary to other disordered materials (e.g., amorphous selenium). In this sense the free carrier transport in aSi:H is similar to the hot carriers in crystals when phonon scattering prevails.