Abstract
The dependence of total integrated light scattering on film thickness is investigated for evaporated PbF2-films and magnetron sputtered Nb2O5-films. The experimental results are discussed on the basis of theoretical model assumptions, relating the scattering behaviour to interface roughness cross-correlation effects as well as to the evolution of film morphology with increasing film thickness. Electron microscopy examinations serve to make evident the different film structures responsible for the specific scattering properties observed.