Investigation of laser ablated metal and polymer plasmas in ambient gas using fast photography
- 28 December 1998
- journal article
- Published by Elsevier in Spectrochimica Acta Part B: Atomic Spectroscopy
- Vol. 53 (14) , 1919-1930
- https://doi.org/10.1016/s0584-8547(98)00236-5
Abstract
No abstract availableThis publication has 29 references indexed in Scilit:
- Role of ambient gas on laser-ablated plumes for thin carbon film depositionPhysical Review B, 1997
- Laser AblationPublished by Springer Nature ,1994
- Theoretical model for deposition of superconducting thin films using pulsed laser evaporation techniqueJournal of Applied Physics, 1990
- Pulsed-laser evaporation technique for deposition of thin films: Physics and theoretical modelPhysical Review B, 1990
- Ablation of polytetrafluoroethylene (Teflon) with femtosecond UV excimer laser pulsesApplied Physics Letters, 1989
- Ultraviolet laser ablation of polyimide filmsJournal of Applied Physics, 1987
- Dynamics of UV laser ablation of organic polymer surfacesJournal of Applied Physics, 1986
- Velocity distribution of molecular fragments from polymethylmethacrylate irradiated with UV laser pulsesApplied Physics Letters, 1986
- Laser ablation of organic polymers: Microscopic models for photochemical and thermal processesJournal of Applied Physics, 1985
- Self-developing photoetching of poly(ethylene terephthalate) films by far-ultraviolet excimer laser radiationApplied Physics Letters, 1982