Pulsed-laser evaporation technique for deposition of thin films: Physics and theoretical model
- 1 May 1990
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 41 (13) , 8843-8859
- https://doi.org/10.1103/physrevb.41.8843
Abstract
We have studied in detail the physical phenomena involved in the interaction of high-powered nanosecond excimer-laser pulses with bulk targets resulting in evaporation, plasma formation, and subsequent deposition of thin films. A theoretical model for simulating these laser-plasma–solid interactions has been developed. In this model, the laser-generated plasma is treated as an ideal gas at high pressure and temperature, which is initially confined in small dimensions, and is suddenly allowed to expand in vacuum. The three-dimensional expansion of this plasma gives rise to the characteristic spatial thickness and compositional variations observed in laser-deposited thin films of multicomponent systems. The forward-directed nature of the laser evaporation process has been found to result from anisotropic expansion velocities of the atomic species which are controlled by the dimensions of the expanding plasma.Keywords
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