Effect of Oxygen Partial Pressure on Nitridation of Silicon
- 1 November 1975
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 58 (11-12) , 527
- https://doi.org/10.1111/j.1151-2916.1975.tb18778.x
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Oxygen Content of Alpha Silicon NitrideJournal of the American Ceramic Society, 1973
- Effect of Oxygen Impurities on the Nitridation of High‐Purity SiliconJournal of the American Ceramic Society, 1973
- Kinetics of the Oxidation and Nitridation of Silicon at High TemperaturesThe Journal of Physical Chemistry, 1958