Electron-beam-controlled discharge pumping of the XeF laser
- 1 October 1976
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 29 (7) , 426-428
- https://doi.org/10.1063/1.89106
Abstract
Laser action of XeF has been obtained in atmospheric‐pressure mixtures of 0.1% NF3, 0.4% Xe, and 99.5% Ar with electron‐beam‐controlled discharge pumping. The mean discharge current and voltage were 75 A/cm2 and 11 kV/cm, respectively, at 4 atm total pressure. The high‐energy E‐beam current was 12 A/cm2. Mechanisms for creating XeF* in a discharge are discussed. Physical processes which limit the intrinsic efficiency to 0.3% in the present device are also discussed.Keywords
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