Stability of a-Si:H deposited at high temperatures and hydrogen dilution in a remote hydrogen plasma reactor
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 235-238
- https://doi.org/10.1016/s0022-3093(05)80099-7
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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