Effects of electric field on silicide formation
- 1 June 1997
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 117-118, 289-293
- https://doi.org/10.1016/s0169-4332(97)80096-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Dopant effect on intrinsic diffusivity in nickel silicidePhysical Review B, 1988
- Effects of substrate crystallinity and dopant on the growth kinetics of platinum silicidesJournal of Applied Physics, 1985
- Simple estimate of electromigration failure in metallic thin filmsJournal of Applied Physics, 1982
- Epitaxial growth of the nickel disilicide phaseThin Solid Films, 1980
- An interface — marker technique applied to the study of metal silicide growthNuclear Instruments and Methods, 1980
- Influence of the nature of the Si substrate on nickel silicide formed from thin Ni filmsThin Solid Films, 1976