The sputter behaviour of vanadium silicide studied by a computer simulation technique
- 30 November 1986
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 60 (7) , 553-555
- https://doi.org/10.1016/0038-1098(86)90269-3
Abstract
No abstract availableKeywords
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- Sputtering Yields for Low Energy He+-, Kr+-, and Xe+-Ion BombardmentJournal of Applied Physics, 1962