Sputtering Yields for Low Energy He+-, Kr+-, and Xe+-Ion Bombardment
- 1 May 1962
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 33 (5) , 1842-1845
- https://doi.org/10.1063/1.1728843
Abstract
Sputtering yields of various metals have been determined for He+‐, Kr+‐, and Xe+‐ion bombardment in the energy range 100 to 600 ev. Yields at 400 ev show a periodic dependence on atomic number similar to that of the reciprocals of the heats of sublimation.This publication has 9 references indexed in Scilit:
- Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 evJournal of Applied Physics, 1961
- Auger Electron Ejection from Germanium and Silicon by Noble Gas IonsPhysical Review B, 1960
- Sputtering Thresholds and Displacement EnergiesPhysical Review Letters, 1960
- Angular Distribution of Sputtered MaterialJournal of Applied Physics, 1960
- Sputtering Yield of Germanium in Rare GasesJournal of Applied Physics, 1959
- Low-Energy Sputtering Yields in HgPhysical Review B, 1958
- Sputtering Yields for Normally Incident-Ion Bombardment at Low Ion EnergyPhysical Review B, 1957
- Auger Ejection of Electrons from Molybdenum by Noble Gas IonsPhysical Review B, 1956
- Auger Ejection of Electrons from Tungsten by Noble Gas IonsPhysical Review B, 1956