The combined effects of strain and heavy doping on the indirect band gap of Si and GexSi1−x alloys
- 31 May 1991
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 34 (5) , 445-451
- https://doi.org/10.1016/0038-1101(91)90148-r
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Valence band engineering in strained-layer structuresSemiconductor Science and Technology, 1989
- Si/Si/sub 1-x/Ge/sub x/ heterojunction bipolar transistors produced by limited reaction processingIEEE Electron Device Letters, 1989
- Band-gap narrowing in heavily doped silicon: A comparison of optical and electrical dataJournal of Applied Physics, 1988
- Gap Shift in Doped Semiconductors at Finite TemperaturesPhysica Status Solidi (b), 1985
- Universal Approximation Formulas for the Gap Shift in Doped SemiconductorsPhysica Status Solidi (b), 1985
- Indirect band gap of coherently strained bulk alloys on 〈001〉 silicon substratesPhysical Review B, 1985
- Measuring and modeling minority carrier transport in heavily doped siliconSolid-State Electronics, 1985
- From band tailing to impurity-band formation and discussion of localization in doped semiconductors: A multiple-scattering approachPhysical Review B, 1983
- Band-gap narrowing in heavily doped many-valley semiconductorsPhysical Review B, 1981
- Energy gap in Si and Ge: Impurity dependenceJournal of Applied Physics, 1980