Aspects of quantitative secondary ion mass spectrometry
- 1 January 1980
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 168 (1-3) , 343-356
- https://doi.org/10.1016/0029-554x(80)91275-6
Abstract
No abstract availableKeywords
This publication has 57 references indexed in Scilit:
- Quantitative analysis of oxygen in thin epitaxial layers of GaAs by SIMSNuclear Instruments and Methods, 1978
- Comparison of xenon retention in ion implanted silicon dioxide and oxygen-doped siliconNuclear Instruments and Methods, 1978
- Quantitative ion probe measurement using matrix ion species ratiosAnalytical Chemistry, 1978
- Quantitation of secondary ion mass spectrometric images by microphotodensitometry and digital image processingAnalytical Chemistry, 1977
- Some Aspects of the Quantitative Interpretation of Sputtered Ion Mass SpectraJapanese Journal of Applied Physics, 1976
- Ion microscopyAnalytical Chemistry, 1975
- The effects of oxygen adsorption on the positive secondary ion yield of stainless steelJournal of Vacuum Science and Technology, 1974
- Die Analyse monomolekularer FestkörperoberflÄchenschichten mit Hilfe der SekundÄrionenemissionThe European Physical Journal A, 1970
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- Eine Quelle für starke Ströme negativer schwerer IonenThe European Physical Journal A, 1968