Electronic structure, diffusion, and p-doping at the Au/F16CuPc interface
- 1 November 2001
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 90 (9) , 4549-4554
- https://doi.org/10.1063/1.1406967
Abstract
Interfaces formed by evaporating Au on copper hexadecafluorophthalocyanine and on Au are studied via ultraviolet photoemission spectroscopy and x-ray photoemission spectroscopy. The energy position of the molecular levels is found to depend on the deposition sequence. The Au-on- interface exhibits a lower hole injection barrier than the interface. This behavior is attributed to the diffusion of Au into the organic matrix at the Au-on-top interface, in which they behave as acceptors. Band bending consistent with p doping, i.e., upward away from the metal interface, is observed in Au-doped films. Current–voltage measurements on Au/ sandwich structures show a higher electron injection barrier at the top Au electrode contact than at the bottom electrode contact, also consistent with p-type doping by Au.
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