Thermodynamic investigation of selective tungsten chemical vapour deposition: Influence of growth conditions and gas additives on the selectivity in the fluoride process
- 1 March 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 158 (1) , 107-122
- https://doi.org/10.1016/0040-6090(88)90307-0
Abstract
No abstract availableKeywords
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- Selective Low Pressure Chemical Vapor Deposition of TungstenJournal of the Electrochemical Society, 1984
- JANAF Thermochemical Tables, 1982 SupplementJournal of Physical and Chemical Reference Data, 1982
- JANAF Thermochemical Tables, 1974 SupplementJournal of Physical and Chemical Reference Data, 1974