The effect of argon during the plasma-assisted chemical vapor deposition of TiN
- 1 December 1988
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 167 (1-2) , L31-L34
- https://doi.org/10.1016/0040-6090(88)90516-0
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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