The growth and physical properties of low pressure chemically vapour-deposited films of tantalum silicide on n+-type polycrystalline silicon
- 1 April 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 138 (1) , 131-140
- https://doi.org/10.1016/0040-6090(86)90223-3
Abstract
No abstract availableKeywords
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