Replication of Vertical Features Smaller than 2 nm by Soft Lithography
- 12 November 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Journal of the American Chemical Society
- Vol. 125 (49) , 14986-14987
- https://doi.org/10.1021/ja0367647
Abstract
This communication demonstrates a simple, soft lithographic approach to the replication and metrology of nanoscale vertical displacements. We patterned test structures with regular patterns that minimize artifacts in measurements by atomic force microscopy. A composite stamp of poly(dimethylsiloxane) (PDMS) molded against the original test structure served as a template to generate polyurethane replicas. We replicated vertical displacements down to ∼1.5 nm. This replication demonstrates the capability of soft lithography to reproduce features with dimensions similar to those of large molecules.Keywords
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