Resist process development for sub-100-nm ion projection lithography
- 1 September 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 57-58, 517-524
- https://doi.org/10.1016/s0167-9317(01)00543-3
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Overview of the ion projection lithography European MEDEA and international programPublished by SPIE-Intl Soc Optical Eng ,2000
- Chemically amplified deep ultraviolet resist for positive tone ion exposureJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997