Tip-induced local anodic oxidation on the nativeSiO2layer of Si(111) using an atomic force microscope

Abstract
Atomic force mocroscope (AFM) tip-induced local anodic oxidation on a native SiO2 layer of Si(111) which is in contact mode is presented in an ambient way. This local anodic oxidation was subjected to varying sample voltages. When an AFM tip was positioned on a surface point with various voltage pulses of 10 V point oxide protrusions were tip induced. The protruded height grew exponentially due to the duration. Large-area oxide bumps also become tip induced when an AFM tip was swept across large surface areas. The bump height increased and was linearly dependent on the sample voltage. Two possible approaches to local anodic oxidation on the native SiO2 layer are discussed.