Ion-induced chemical vapor deposition of high purity Cu films at room temperature using a microwave discharge H atom beam source
- 1 September 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 15 (5) , 2677-2686
- https://doi.org/10.1116/1.580942
Abstract
No abstract availableKeywords
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