Preparation And Photovoltaic Properties Of Tin Sulfide And Tin Oxysulfide Thin Films By Spray Pyrolysis Technique
- 1 January 1997
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
Tin sulfide and a related novel compound, tin oxysulfide, thin films were deposited from the aqueous solution containing tin (11) chloride and thiourea by a spray pyrolysis technique. The constituent atoms of the thin films have merits of nontoxicity and availability. Physical and photovoltaic properties of both films were also investigated. It has, therefore, been considered that these two compounds become a promising absorbing layer for solar cell on account photovoltaic ability with high absorption coefficient and appropriate bandgap energy.Keywords
This publication has 9 references indexed in Scilit:
- Oriented Growth of Tin Oxide Thin Films on Glass Substrates by Spray Pyrolysis of Organotin CompoundsJournal of the American Ceramic Society, 1996
- Tin sulphide films deposited by plasma-enhanced chemical vapour depositionSemiconductor Science and Technology, 1996
- The Optical and Photoelectrochemical Properties of Electrodeposited CdS and SnS Thin FilmsBulletin of the Chemical Society of Japan, 1995
- Spray pyrolysis deposition of SnxSythin filmsSemiconductor Science and Technology, 1994
- Characterization of vacuum-evaporated tin sulfide film for solar cell materialsSolar Energy Materials and Solar Cells, 1994
- Optical properties of stannous oxide thin filmsCzechoslovak Journal of Physics, 1992
- Simplified chemical deposition technique for good quality SnS thin filmsSemiconductor Science and Technology, 1991
- Influence of temperature and pressure on the electronic transitions in SnS and SnSe semiconductorsPhysical Review B, 1990
- Low Temperature Chemical Precipitation and Vapor Deposition of Sn x S Thin FilmsJournal of the Electrochemical Society, 1987