Holographic lithography with thick photoresist
- 1 November 1983
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 43 (9) , 874-875
- https://doi.org/10.1063/1.94533
Abstract
Gratings with periods as fine as 199 nm and height‐to‐width ratios ∼5:1 have been produced directly in photoresist by holographic lithography using a technique that reduces ‘‘orthogonal standing wave’’ problems. The technique uses a single layer of photoresist to attenuate the ‘‘orthogonal standing wave,’’ as well as record the grating pattern. The technique is tolerant of process variations and produces structures suitable for further processing steps such as liftoff and etching.Keywords
This publication has 2 references indexed in Scilit:
- A simple technique for modifying the profile of resist exposed by holographic lithographyJournal of Vacuum Science and Technology, 1981
- Multilevel Resist For Photolithography Utilizing An Absorbing Dye: Simulation And ExperimentPublished by SPIE-Intl Soc Optical Eng ,1981