Thermally Stable Polyoxocarbosilane Thin Films by Pulsed IR Laser Ablation of Poly[oxy(tetramethyldisilane-1,2-diyl)]
- 19 February 2002
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 14 (3) , 1242-1248
- https://doi.org/10.1021/cm0112338
Abstract
No abstract availableKeywords
This publication has 39 references indexed in Scilit:
- IR laserinduced thermolysis and UV laserinduced photolysis of 1,3diethyldisiloxane: chemical vapour deposition of nanotextured hydridoalkylsiliconesJournal of Materials Chemistry, 2001
- Control of structures of deposited polymer films by ablation laser wavelength: Polyacrylonitrile at 308, 248, and 193 nmJournal of Applied Physics, 1996
- Morphology, phase transitions and viscoelastic properties of poly(oxybisdimethylsilylene). A mesophase in a silicon analogue of a polyetherMacromolecular Chemistry and Physics, 1995
- Laser Ablation and the Production of Polymer FilmsScience, 1993
- Organic thin films formation by laser ablation.Journal of Photopolymer Science and Technology, 1993
- Laser evaporation of some solid organosilicon polymersApplied Organometallic Chemistry, 1991
- Formation of polymer films by pulsed laser evaporationApplied Physics Letters, 1988
- Ablative photodecomposition: action of far-ultraviolet (193 nm) laser radiation on poly(ethylene terephthalate) filmsJournal of the American Chemical Society, 1982
- Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laserApplied Physics Letters, 1982
- Methylpolysiloxanes1Journal of the American Chemical Society, 1946