High rate reactive sputtering using gas pulsing: a technique for the creation of films onto large, flat substrates
- 30 August 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 351 (1-2) , 32-36
- https://doi.org/10.1016/s0040-6090(99)00081-4
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- High-rate aluminum oxide deposition by MetaModeTM reactive sputteringJournal of Vacuum Science & Technology A, 1992
- Reactive sputtering with an unbalanced magnetronJournal of Vacuum Science & Technology A, 1992
- Voltage-controlled DC reactive magnetron sputtering of indium-doped zinc oxide filmsJournal of Physics D: Applied Physics, 1992
- Ion-assisted reactive deposition processes for optical coatingsSurface and Coatings Technology, 1990
- The formation and control of direct current magnetron discharges for the high-rate reactive processing of thin filmsJournal of Vacuum Science & Technology A, 1989
- Pressure stability in reactive magnetron sputteringThin Solid Films, 1988
- Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputteringThin Solid Films, 1984