Distribution and Precipitation of Gold in Phosphorus-Diffused Silicon
- 1 May 1966
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 37 (6) , 2453-2457
- https://doi.org/10.1063/1.1708836
Abstract
Distribution of gold in silicon wafers diffused with phosphorus was studied at different depths through electron‐transmission microscopy and radio‐tracer techniques. Phosphorus‐gold precipitates were observed in the surface of the wafer in which gold was diffused from the other side. The distribution and precipitation of gold in the phosphorus‐rich regions is shown to be consistent with the Reiss theory of solubility of impurities in doped semiconductors.This publication has 14 references indexed in Scilit:
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