Silicon oxide/silicon nitride dual-layer films: a stacked gate dielectric for the 21st century
- 1 September 1999
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 254 (1-3) , 26-37
- https://doi.org/10.1016/s0022-3093(99)00432-9
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
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