Investigation of d.c.-reactive magnetron-sputtered AlN thin films by electron microprobe analysis, X-ray photoelectron spectroscopy and polarised infra-red reflection
- 4 August 1998
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 106 (2-3) , 205-208
- https://doi.org/10.1016/s0257-8972(98)00527-1
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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