Low-loss integrated optical waveguides fabricated by nitrogen ion implantation
- 15 September 1983
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 43 (6) , 519-520
- https://doi.org/10.1063/1.94423
Abstract
A technique for fabricating low-loss (on the order of 0.1 dB/cm) integrated optical waveguides in amorphous SiO2-based material by nitrogen ion implantation is reported. By comparing the results of nitrogen implantation and oxygen implantation in SiO2, the mechanism of waveguide formation in the nitrogen-implanted waveguides is shown to be chemical doping effect of the nitrogen dissolved in amorphous SiO2.Keywords
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