The effects of nitrogen flow on reactively sputtered TiAlN films
- 28 February 1995
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 71 (1) , 30-36
- https://doi.org/10.1016/0257-8972(94)02300-f
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Physically vapor deposited coatings on tools: performance and wear phenomenaSurface and Coatings Technology, 1991
- The development of the PVD coating TiAlN as a commercial coating for cutting toolsSurface and Coatings Technology, 1991
- Three-dimensional grain size control for simultaneous improvement of hardness and impact adhesion in (Ti,Al)N films on high speed steelSurface and Coatings Technology, 1989
- New results in d.c. reactive magnetron deposition of TiNx filmsThin Solid Films, 1988
- Techniques for evaluating mechanical properties of hard coatingsJournal of Vacuum Science & Technology A, 1985
- Structure and properties of TiN coatingsThin Solid Films, 1985
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film compositionThin Solid Films, 1983
- Effect of N2Ar mixing on the reactive sputtering characteristics of siliconThin Solid Films, 1983
- Reactive ion beam sputtering of thin films of lead, zirconium and titaniumThin Solid Films, 1977
- Quasi-static solid particle damage in brittle solids—I. Observations analysis and implicationsActa Metallurgica, 1976