In Situ Mass and Photoemission Studies of Fluorinated Polyimide Films Irradiated with an Electron Beam

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Abstract
Fluorinated polyimide films were irradiated in an ultrahigh vacuum with an electron beam. In situ mass analysis was carried out simultaneously and in situ photoemission studies were performed on surfaces modified by electron exposure at various electron beam energies and various sample currents. Based on the present data, the irradiation of electrons produces a fluorine-poor surface and an imide-ring opening, and the production rate was accelerated by raising the electron beam energy. An electron beam with low energy and low density is effective for changing the refractive index of the surface of fluorinated polyimide films with small strength change.