Elimination of substrate damage in focused-ion-beam repair of photomask
- 1 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4) , 611-616
- https://doi.org/10.1016/0167-9317(87)90095-5
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- High performance very large scale integrated photomask with a silicide filmJournal of Vacuum Science & Technology B, 1986
- Fib Mask Repair With MicrotrimPublished by SPIE-Intl Soc Optical Eng ,1986