Fused Impurity P-N-P Junction Transistors
- 1 November 1952
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in Proceedings of the IRE
- Vol. 40 (11) , 1358-1360
- https://doi.org/10.1109/jrproc.1952.273962
Abstract
Fused impurity p-n-p junction transistors have been made which exhibit the useful circuit characteristics of high-gain, low-noise figure and alpha slightly less than unity. Such transistors are well adapted for application involving high ambient temperatures or high dissipation levels since alpha remains very nearly constant up to 120 degrees C and decreases somewhat above this temperature, permitting their stable use in emitter-grounded circuits at high temperatures. This is in contrast to junction transistors having high-resistivity collector regions, for which alpha often rises above unity at high temperatures leading to circuit instability. Satisfactory operation at several watts collector dissipation has been achieved.Keywords
This publication has 9 references indexed in Scilit:
- Theory of Alpha for P-N-P Diffused Junction TransistorsProceedings of the IRE, 1952
- Power Rectifiers and TransistorsProceedings of the IRE, 1952
- An Experimental Investigation of Transistor NoiseProceedings of the IRE, 1952
- Frequency Variations of Current-Amplification Factor for Junction TransistorsProceedings of the IRE, 1952
- Transistor Operation: Stabilization of Operating PointsProceedings of the IRE, 1952
- Junction TransistorsPhysical Review B, 1951
- Some Circuit Properties and Applications of n-p-n TransistorsProceedings of the IRE, 1951
- Junctions Prepared by Impurity DiffusionPhysical Review B, 1950
- The Theory ofp-nJunctions in Semiconductors andp-nJunction TransistorsBell System Technical Journal, 1949