Metal deposition for microelectronic applications studied by RBS technique
- 15 December 1983
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research
- Vol. 218 (1-3) , 485-488
- https://doi.org/10.1016/0167-5087(83)91026-8
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Ionic decomposition of platinum chloridesNuclear Instruments and Methods in Physics Research, 1983
- Large conductivity changes in ion beam irradiated organic thin filmsApplied Physics Letters, 1982
- Change in stoichiometry of thin films of palladium chloride during ion beam analysisNuclear Instruments and Methods, 1978
- 1.13 Plating with ion acceleratorsVacuum, 1977