Model for the vaporization of mixed organometallic compounds in the metalorganic chemical vapor deposition of high temperature superconducting films
- 4 October 1993
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 63 (14) , 1981-1983
- https://doi.org/10.1063/1.110621
Abstract
A model of the vaporization and mass transport of mixed organometallics from a single source for thin film metalorganic chemical vapor deposition is presented. A stoichiometric gas phase can be obtained from a mixture of the organometallics in the desired mole ratios, in spite of differences in the volatilities of the individual compounds. Proper film composition and growth rates are obtained by controlling the velocity of a carriage containing the organometallics through the heating zone of a vaporizer.Keywords
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