Structure, composition, and surface topography of cadmium telluride films fabricated by a new nonaqueous electroplating technique

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Abstract
A new electroplating technique for growing cadmium telluride films in a nonaqueous medium is reported. The influence of the deposition conditions on the structure, stoichiometry, and surface topography of the CdTe films has been discussed in light of the x-ray diffraction analysis, x-ray photoelectron spectroscopy, and scanning electron microscopy studies. Higher bath temperatures have been found to favor larger grain growth with a certain amount of orientation. The CdTe formation is not favored at temperatures <130 °C. The compositional analysis using x-ray photoelectron spectroscopy indicated that the films deposited under galvanostatic conditions are generally richer in cadmium. Nearly stoichiometric films can be deposited under potentiostatic conditions at a deposition potential of −0.8 V (with respect to Pt neutral electrodes). A uniform and regular growth of CdTe films with no sign of cracking was also observed in the surface investigations by a scanning electron microscope.