THE EFFECT OF PHOSPHORUS IN SiO2 AS SHOWN BY INFRARED SPECTROSCOPY
- 15 September 1965
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 7 (6) , 158-159
- https://doi.org/10.1063/1.1754355
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Stabilization of SiO2 Passivation Layers with P2O5IBM Journal of Research and Development, 1964
- Space-Charge Model for Surface Potential Shifts in Silicon Passivated with Thin Insulating LayersIBM Journal of Research and Development, 1964
- Electrochemical Phenomena in Thin Films of Silicon Dioxide on SiliconIBM Journal of Research and Development, 1964
- Evidence for Oxidation Growth at the Oxide-Silicon Interface from Controlled Etch StudiesJournal of the Electrochemical Society, 1964
- Das ultrarote Reflexionsspektrum von Silikaten. IIThe European Physical Journal A, 1936