Nanocrystalline Si thin films with arrayed void-column network deposited by high density plasma
- 1 July 2000
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 88 (1) , 555-561
- https://doi.org/10.1063/1.373695
Abstract
No abstract availableThis publication has 22 references indexed in Scilit:
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