D.C. cathode sputtering: influence of the oxygen content in the gas flow on the discharge current
- 1 April 1976
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 33 (2) , 173-183
- https://doi.org/10.1016/0040-6090(76)90078-x
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Reactive sputtering of metals in oxidizing atmospheresThin Solid Films, 1973
- A spectroscopic investigation of the reactive sputtering of aluminiumThin Solid Films, 1971
- The mechanism of reactive sputteringJournal of Materials Science, 1968
- Elektrische Leitf higkeit und Struktur aufgest ubter KadmiumoxydschichtenThe European Physical Journal A, 1952