Remote plasma-enhanced chemical vapour deposition with metal organic source gases: principles and applications
- 1 October 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 59 (1-3) , 193-201
- https://doi.org/10.1016/0257-8972(93)90082-y
Abstract
No abstract availableKeywords
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