Electron beam induced fragmentation of fullerene derivatives
- 19 June 1998
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 289 (5-6) , 586-590
- https://doi.org/10.1016/s0009-2614(98)00455-2
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Electron-beam damage of C60 films on hydrogen-passivated Si(100)Applied Physics Letters, 1998
- Covalent Fullerene ChemistryScience, 1996
- Structure of FullerenesPublished by Elsevier ,1996
- Nanolithography Using Fullerene Films as an Electron Beam ResistJapanese Journal of Applied Physics, 1996
- Efficient production of C60 (buckminsterfullerene), C60H36, and the solvated buckide ionThe Journal of Physical Chemistry, 1990
- The vibrational Raman spectra of purified solid films of C60 and C70Chemical Physics Letters, 1990
- Optimization of parameters for semiempirical methods II. ApplicationsJournal of Computational Chemistry, 1989
- Optimization of parameters for semiempirical methods I. MethodJournal of Computational Chemistry, 1989
- C60: BuckminsterfullereneNature, 1985
- Ground states of molecules. 38. The MNDO method. Approximations and parametersJournal of the American Chemical Society, 1977