A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect Environment
- 1 May 1987
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
- Vol. 6 (3) , 431-438
- https://doi.org/10.1109/tcad.1987.1270289
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Application of the simulator “XMAS” on specific problems in sub-half-micron lithographyMicroelectronic Engineering, 1985
- A three-dimensional photoresist image simulator: TRIPS-IIEEE Electron Device Letters, 1985
- RD3D (computer simulation of resist development in three dimensions)IEEE Transactions on Electron Devices, 1981
- Characterization of positive resist developmentIEEE Electron Device Letters, 1981
- Partially coherent imaging in two dimensions and the theoretical limits of projection printing in microfabricationIEEE Transactions on Electron Devices, 1980
- A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithographyIEEE Transactions on Electron Devices, 1979
- Modeling projection printing of positive photoresistsIEEE Transactions on Electron Devices, 1975