The effect of charged particles when preparing ZnO thin film by ion beam sputtering deposition
- 1 September 1988
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 33-34, 1114-1119
- https://doi.org/10.1016/0169-4332(88)90424-2
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- Ion assisted selective thin film depositionJournal of Vacuum Science & Technology A, 1986
- Alignment of thin films by glancing angle ion bombardment during depositionApplied Physics Letters, 1985
- Ion-beam-assisted deposition of thin filmsApplied Optics, 1983
- Influence of Bombardment by Energetic Atoms on c-Axis Orientation of ZnO FilmsJapanese Journal of Applied Physics, 1982
- A saddle field ion source of spherical configuration for etching and thinning applicationsVacuum, 1974