Microcrystal Si Films Prepared by Remote Plasma CVD
- 1 January 1989
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- PLASMA DEPOSITION OF AMORPHOUS AND CRYSTALLINE SILICON: THE EFFECT OF HYDROGEN ON THE GROWTH, STRUCTURE AND ELECTRONIC PROPERTIESPublished by World Scientific Pub Co Pte Ltd ,1989
- Optical and electrical properties of a-Si:H films grown by remote plasma enhanced chemical vapor deposition (RPECVD)Journal of Non-Crystalline Solids, 1987
- Hydrogen plasma etching of amorphous and microcrystalline siliconElectronics Letters, 1987
- Hole Transport in a-Si:H(F) Prepared by Hydrogen-Radical-Assisted Chemical Vapor DepositionJapanese Journal of Applied Physics, 1986
- Elements of X-Ray DiffractionAmerican Journal of Physics, 1957