Intrinsic stress in DC sputtered niobium
- 1 June 1993
- journal article
- research article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Applied Superconductivity
- Vol. 3 (2) , 3029-3031
- https://doi.org/10.1109/77.257236
Abstract
The intrinsic mechanical stress of dc magnetron-sputtered Nb films is characterized as a function of sputtering parameters and target erosion. The zero-stress point shifts to lower cathode voltages as the target erodes. The zero-stress point was always characterized by the same cathode current-Ar pressure relationship.This publication has 5 references indexed in Scilit:
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