Synthesis of sputtered thin films in low energy ion beams
- 1 January 1997
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 121 (1-4) , 65-72
- https://doi.org/10.1016/s0168-583x(96)00370-9
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- The reactive sputtering of oxides and nitridesPublished by Walter de Gruyter GmbH ,1994
- High-rate aluminum oxide deposition by MetaModeTM reactive sputteringJournal of Vacuum Science & Technology A, 1992
- Reactive sputtering with an unbalanced magnetronJournal of Vacuum Science & Technology A, 1992
- Voltage-controlled DC reactive magnetron sputtering of indium-doped zinc oxide filmsJournal of Physics D: Applied Physics, 1992
- Ion-assisted reactive deposition processes for optical coatingsSurface and Coatings Technology, 1990
- The formation and control of direct current magnetron discharges for the high-rate reactive processing of thin filmsJournal of Vacuum Science & Technology A, 1989
- Pressure stability in reactive magnetron sputteringThin Solid Films, 1988
- Charged particle fluxes from planar magnetron sputtering sourcesJournal of Vacuum Science & Technology A, 1986
- Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputteringThin Solid Films, 1984